In collaboration with Shin-Etsu Chemical Co Ltd, Tokyo-based Oki Electric Industry Co Ltd has developed technology that uses its CFB (crystal film bonding) technology to lift off only the gallium nitride (GaN) functional layer from Shin-Etsu Chemical’s QST (Qromis Substrate Technology) substrate (a composite material substrate developed by California-based Qromis Inc and licensed exclusively for GaN growth to Shin-Etsu in 2019) and bond it to a different material substrate...
Source: https://www.semiconductor-today.com/new ... 1123.shtml